The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2019

Filed:

Sep. 06, 2016
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Hans-Jochen Paul, Aalen, DE;

Boris Bittner, Roth, DE;

Norbert Wabra, Werneck, DE;

Thomas Schicketanz, Aalen, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 27/00 (2006.01); G21K 1/06 (2006.01); G02B 5/08 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70225 (2013.01); G02B 5/0833 (2013.01); G02B 5/0891 (2013.01); G02B 5/208 (2013.01); G02B 27/005 (2013.01); G03F 7/70266 (2013.01); G03F 7/70316 (2013.01); G03F 7/70891 (2013.01); G03F 7/70958 (2013.01); G21K 1/062 (2013.01);
Abstract

An optical arrangement includes an optical element () and a thermal manipulation device. The optical element has a substrate (), a coating () applied to the substrate (), and an antireflection coating (). The coating () includes: a reflective multi-layer coating () configured to reflect radiation () with a used wavelength (λ). The antireflection coating () is arranged between the substrate () and the reflective multi-layer coating () to suppress reflection of heating radiation () with a heating wavelength (λ) that differs from the used wavelength (λ). The thermal manipulation device has at least one heating light source () to produce heating radiation ().


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