The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2019

Filed:

Jul. 12, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Ching-Ling Meng, Sunnyvale, CA (US);

Holger Tuitje, Fremont, CA (US);

Yan Chen, Santa Clara, CA (US);

Mihail Mihaylov, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/443 (2006.01); G01N 21/68 (2006.01); G01N 21/31 (2006.01);
U.S. Cl.
CPC ...
G01J 3/443 (2013.01); G01N 21/31 (2013.01); G01N 21/68 (2013.01); G01N 2201/10 (2013.01);
Abstract

Disclosed is a method, system, and apparatus for optical emission measurement. The apparatus includes a collection system for collecting a plasma optical emission spectra through an optical window disposed at a wall of a plasma processing chamber. The optical system includes a mirror configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra.


Find Patent Forward Citations

Loading…