The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
Oct. 12, 2017
Applicant:
Mei, Llc, Albany, OR (US);
Inventor:
Scott Tice, Albany, OR (US);
Assignee:
MEI Wet Processing Systems & Services LLC, Albany, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B 21/14 (2006.01); H01L 21/67 (2006.01); F26B 3/04 (2006.01); F26B 5/00 (2006.01); F26B 15/08 (2006.01); H01L 21/677 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
F26B 21/14 (2013.01); F26B 3/04 (2013.01); F26B 5/00 (2013.01); F26B 15/08 (2013.01); H01L 21/67017 (2013.01); H01L 21/67023 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67781 (2013.01); H01L 21/02057 (2013.01);
Abstract
Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.