The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
Aug. 06, 2015
Gas supply system, plasma processing apparatus, and operation method for plasma processing apparatus
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Atsushi Sawachi, Miyagi, JP;
Norikazu Sasaki, Miyagi, JP;
Jun Yamashima, Miyagi, JP;
Yoshiyasu Sato, Miyagi, JP;
Kenichi Nogami, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); H01L 21/3065 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45561 (2013.01); C23C 16/455 (2013.01); C23C 16/45523 (2013.01); C23C 16/45587 (2013.01); C23C 16/509 (2013.01); H01J 37/3244 (2013.01); H01L 21/02274 (2013.01); H01L 21/3065 (2013.01); H01L 21/67017 (2013.01);
Abstract
A gas supply system includes a first device to a third device. A plurality of integral units of the first device is configured to select one or more gases from one or more gas sources and supply the selected gases. The second device is configured to distribute plural gases from the integral units and supply the distributed gases while controlling flow rates of the distributed gases. The third device is configured to exhaust the gases within the gas supply system to a gas exhaust device.