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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10468268 B1

PDFFull Text
Date of Patent:
Nov. 05, 2019

Filed:

Aug. 18, 2014

Etching method

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Ryoichi Yoshida, Miyagi, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

IPUSA, PLLC

Primary Examiner:

Thomas T Pham

Int. Cl.
CPC ...
H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/027 (2006.01); H01J 37/32 (2006.01); H01L 21/3105 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 21/31138 (2013.01); H01J 37/3266 (2013.01); H01J 37/32091 (2013.01); H01J 37/32165 (2013.01); H01L 21/0271 (2013.01); H01L 21/31058 (2013.01); H01L 21/31144 (2013.01); B82Y 40/00 (2013.01);
Abstract

There is provided an etching method for etching an object to be processed by using a substrate processing apparatus including a process chamber including a first electrode and a second electrode disposed opposite to the first electrode to receive the object to be processed thereon. The etching method includes a process of removing at least one of a first polymer and a second polymer by etching the object to be processed on which a pattern of the first polymer and the second polymer is formed by phase separation of a block copolymer containing the first polymer and the second polymer at a temperature lower than or equal to 10 degrees C. by using plasma of a process gas.

Find Patent Forward Citations

Yoshida, Ryoichi. (2019). Etching method (U.S. Patent No. 10468268). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10468268

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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