The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

Nov. 01, 2017
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Lucius M. Sherwin, Plano, TX (US);

Song Zheng, Allen, TX (US);

Chris Murray Beard, Allen, TX (US);

Noppawan Boorananut, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/44 (2012.01); H01L 21/027 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70608 (2013.01); B81C 1/00404 (2013.01); G03F 1/44 (2013.01); G03F 7/20 (2013.01); H01L 21/0274 (2013.01); B81C 2201/0157 (2013.01);
Abstract

Methods and apparatus to control grayscale lithography are disclosed. A disclosed example apparatus for adjusting a grayscale lithography process includes an optical measurement device to optically measure portions of a patterned wafer, and a processor to calculate a profile based on the measured portions, and to determine an adjustment of the grayscale lithography process based on the calculated profile. The disclosed apparatus also includes an adjuster to control the grayscale lithography process based on the adjustment.


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