The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Mar. 24, 2017
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Minjong Kim, Hwaseong-si, KR;
Seonggil Park, Suwon-si, KR;
Jaebeom Park, Yongin-si, KR;
Jung-soo Yoon, Hwaseong-si, KR;
Keeyoung Jun, Seongnam-si, KR;
Choongrae Cho, Hwaseong-si, KR;
Jongwon Hong, Seoul, KR;
Abstract
Disclosed is a substrate processing apparatus. The substrate processing apparatus comprises a process chamber providing an inner space where a substrate is treated, a support unit disposed in the inner space and supporting the substrate, and a gas supply unit providing the inner space with a process gas required for generating plasma. The support unit comprises a base having a top surface on which the substrate is placed, a heater disposed in the base, and a coating layer formed on the top surface of the base.