The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Dec. 30, 2016
L'air Liquide, Societe Anonyme Pour I'etude ET I'exploitation Des Procedes Georges Claude, Paris, FR;
Satoko Gatineau, Seoul, KR;
Daehyeon Kim, Seoul, KR;
Wontae Noh, Seoul, KR;
Julien Gatineau, Seoul, KR;
Jean-Marc Girard, Versailles, FR;
Abstract
Group 4 transition metal-containing film forming compositions comprising Group 4 transition metal precursors having the formula: wherein M is Ti, Zr, or Hf; each E is independently C, Si, B or P; m and n is independently 0, 1 or 2; m+n>1; o and p is independently 0, 1 or 2; o+p>1; each R is independently hydrogen or or a C-Chydrocarbon group; each L is independently a −1 anionic ligand selected from the group consisting of NR', OR′, Cp, amidinate, β-diketonate or keto-iminate, wherein R′ is a H or a C-Chydrocarbon group; and each L′ is independently NR″ or O, wherein R″ is a H or a C-Chydrocarbon group. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.
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