The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Oct. 04, 2017
Applicant:
Versum Materials Us, Llc, Tempe, AZ (US);
Inventors:
Meiliang Wang, Carlsbad, CA (US);
Xinjian Lei, Vista, CA (US);
Manchao Xiao, San Diego, CA (US);
Suresh Kalpatu Rajaraman, San Marcos, CA (US);
Assignee:
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); C07F 7/10 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C07F 7/10 (2013.01); C23C 16/401 (2013.01); C23C 16/4408 (2013.01); C23C 16/45536 (2013.01); C23C 16/45542 (2013.01); C23C 16/45553 (2013.01); C23C 16/50 (2013.01); H01L 21/0228 (2013.01); H01L 21/02126 (2013.01); H01L 21/02164 (2013.01); H01L 21/02211 (2013.01); H01L 21/02219 (2013.01); H01L 21/02274 (2013.01);
Abstract
Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one precursor, wherein the at least one precursor has a structure represented by Formula A: wherein R, R, R, R, R, and Rare defined herein.