The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2019

Filed:

Mar. 08, 2017
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Dirk Ewoud Boonzajer Flaes, Amsterdam, NL;

Stefan Michiel Witte, Hoofddorp, NL;

Kjeld Sijbrand Eduard Eikema, Hoofddorp, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01B 11/00 (2006.01); G01N 21/47 (2006.01); G01N 21/956 (2006.01); G02B 21/16 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G01B 11/00 (2013.01); G01N 21/4788 (2013.01); G01N 21/956 (2013.01); G02B 21/16 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G01N 2201/061 (2013.01); G01N 2201/0635 (2013.01); H05G 2/003 (2013.01); H05G 2/008 (2013.01);
Abstract

In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.


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