The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2019

Filed:

Sep. 27, 2013
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Hyun Mo Cho, Daejeon, KR;

Yong Jai Cho, Daejeon, KR;

Won Chegal, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01N 21/05 (2006.01); G01N 21/41 (2006.01); G01N 21/25 (2006.01);
U.S. Cl.
CPC ...
G01N 21/211 (2013.01); G01N 21/05 (2013.01); G01N 21/41 (2013.01); G01N 21/253 (2013.01); G01N 2201/0683 (2013.01); G01N 2201/06113 (2013.01);
Abstract

An apparatus and method for simultaneously measuring, in an immersion microchannel environment, the characteristics of molecular junctions such as a low-molecular-weight biomaterial and the like and the refractive index of a buffer solution by using ellipsometry. Specifically, disclosed is an apparatus for simultaneously measuring, with high sensitivity, the change in refractive index of a buffer solution and the junction dynamic characteristics of a biomaterial by allowing polarized incident light to be received at a biomaterial adsorption layer, which is formed on a substrate such as a semiconductor and the like, so as to meet an anti-reflection condition of a P-wave by using a prism structure and a microchannel; and a measurement method using the same.


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