The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2019

Filed:

Feb. 29, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Georgiy Vaschenko, San Diego, CA (US);

Peter Baumgart, San Diego, CA (US);

Chirag Rajyaguru, San Diego, CA (US);

Benjamin Sams, San Diego, CA (US);

Armin Ridinger, San Diego, CA (US);

Janine Kardokus, San Diego, CA (US);

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22B 3/00 (2006.01); H05G 2/00 (2006.01); C22B 9/04 (2006.01); C22B 25/08 (2006.01); F27B 17/00 (2006.01); F27B 17/02 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); C22B 9/04 (2013.01); C22B 25/08 (2013.01); F27B 17/00 (2013.01); F27B 17/02 (2013.01); H05G 2/005 (2013.01);
Abstract

A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.


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