The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Nov. 30, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Nick Kant, Utrecht, NL;
Nico Vanroose, Borgerhout, BE;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/706 (2013.01); G01M 11/0242 (2013.01); G03F 7/20 (2013.01); G03F 7/705 (2013.01); G03F 7/70258 (2013.01); G03F 7/70308 (2013.01);
Abstract
A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.