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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10451968 B1

PDFFull Text
Date of Patent:
Oct. 22, 2019

Filed:

Sep. 06, 2017

Resist composition and method of forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventor:

Tatsuya Fujii, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe, Martens, Olson & Bear LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); H01L 21/027 (2006.01); G03F 7/26 (2006.01); G03F 7/20 (2006.01); C08F 220/26 (2006.01); C07C 69/54 (2006.01); C07D 307/93 (2006.01); C07D 309/12 (2006.01); C08F 12/24 (2006.01); C08F 220/18 (2006.01); C08F 220/30 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); C08F 220/28 (2006.01); C08F 212/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 69/54 (2013.01); C07D 307/93 (2013.01); C07D 309/12 (2013.01); C08F 12/24 (2013.01); C08F 220/18 (2013.01); C08F 220/26 (2013.01); C08F 220/28 (2013.01); C08F 220/30 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2037 (2013.01); G03F 7/2041 (2013.01); G03F 7/26 (2013.01); G03F 7/322 (2013.01); H01L 21/0274 (2013.01); C08F 212/14 (2013.01);
Abstract

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and a fluorine additive component (F) which exhibits decomposability to an alkali developing solution, the fluorine additive component (F) including a fluorine resin component (F1) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a group represented by general formula (f2-r-1) shown below in which each Rfindependently represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxy group, a hydroxyalkyl group or a cyano group; n″ represents an integer of 0 to 2; and * represents a valence bond.

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Fujii, Tatsuya. (2019). Resist composition and method of forming resist pattern (U.S. Patent No. 10451968). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10451968

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