The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2019

Filed:

Jan. 13, 2018
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Yi-Koan Hong, Yongin-si, KR;

Kwang-Jin Moon, Hwaseong-si, KR;

Nae-In Lee, Seoul, KR;

Ho-Jin Lee, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 51/44 (2006.01); H01L 25/065 (2006.01); H01L 23/532 (2006.01); H01L 23/538 (2006.01); H01L 21/768 (2006.01); H01L 51/00 (2006.01); H01L 23/00 (2006.01); B82Y 99/00 (2011.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
H01L 51/444 (2013.01); H01L 21/768 (2013.01); H01L 23/538 (2013.01); H01L 23/5329 (2013.01); H01L 23/53223 (2013.01); H01L 23/53238 (2013.01); H01L 23/53276 (2013.01); H01L 24/80 (2013.01); H01L 25/0657 (2013.01); H01L 51/0048 (2013.01); B82Y 10/00 (2013.01); B82Y 99/00 (2013.01); H01L 2224/16145 (2013.01); H01L 2224/16227 (2013.01); H01L 2225/06517 (2013.01); H01L 2225/06524 (2013.01);
Abstract

A semiconductor device includes a first conductive pattern at an upper portion of a first insulating interlayer on a first substrate, a first plurality of conductive nanotubes (CNTs) extending vertically, a second conductive pattern at a lower portion of a second insulating interlayer beneath a second substrate, and a second plurality of CNTs extending vertically. A lower surface of the second insulating interlayer contacts an upper surface of the first insulating interlayer. At least a portion of a sidewall of each of the first plurality of CNTs is covered by the first conductive pattern, and at least a portion of a sidewall of each of the second plurality of CNTs is covered by the second conductive pattern. The first and second conductive patterns vertically face each other, and at least one of the first plurality of CNTs and at least one of the second plurality of CNTs contact each other.


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