The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Sep. 26, 2017
Applicant:
Nxp Usa, Inc., Austin, TX (US);
Inventors:
William Ernest Edwards, Dexter, MI (US);
Brian George Anthony, Austin, TX (US);
Assignee:
NXP USA, INC., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76807 (2013.01); H01L 21/76816 (2013.01); H01L 21/76829 (2013.01); H01L 21/76877 (2013.01); H01L 2221/1031 (2013.01);
Abstract
A method of protecting a dielectric during fabrication is provided. A conductive layer is patterned to form a first conductive shape on a first portion of a dielectric layer and a second conductive shape on a second portion of the dielectric layer. A conductive trace is formed over at least a portion of the second conductive shape. The conductive trace electrically connects the first conductive shape with a substrate tie. An interconnect layer is coupled to the first conductive shape. The conductive trace is etched to electrically isolate the first conductive shape from the substrate tie.