The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Jun. 19, 2018
Applicant:
Jeol Ltd., Tokyo, JP;
Inventor:
Shigeyuki Morishita, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/22 (2006.01); H01J 37/14 (2006.01); H01J 37/28 (2006.01); H01J 37/302 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/14 (2013.01); H01J 37/226 (2013.01); H01J 37/28 (2013.01); H01J 37/302 (2013.01); H01J 2237/153 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/2802 (2013.01);
Abstract
There is provided a method which is for use in a charged particle beam system including an illumination system equipped with an aberration corrector having a plurality of stages of multipole elements and a transfer lens system disposed between the multipole elements, the method being capable of correcting distortion in a shadow of an aperture of the illumination system. The method involves varying excitations of the transfer lens system to correct distortion in the shadow of the aperture of the illumination system.