The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2019

Filed:

Jul. 11, 2017
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Andreas Meiser, Sauerlach, DE;

Rolf Weis, Dresden, DE;

Franz Hirler, Isen, DE;

Martin Vielemeyer, Villach, AT;

Markus Zundel, Egmating, DE;

Peter Irsigler, Obernberg am Inn, AT;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/92 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/40 (2006.01); H01L 29/10 (2006.01); H01L 27/12 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4175 (2013.01); H01L 29/4236 (2013.01); H01L 29/66659 (2013.01); H01L 29/66681 (2013.01); H01L 29/66696 (2013.01); H01L 29/7824 (2013.01); H01L 29/7825 (2013.01); H01L 29/7826 (2013.01); H01L 29/7835 (2013.01); H01L 27/1203 (2013.01); H01L 29/0692 (2013.01); H01L 29/0696 (2013.01); H01L 29/1095 (2013.01); H01L 29/402 (2013.01); H01L 29/407 (2013.01); H01L 29/41766 (2013.01);
Abstract

A semiconductor device includes a transistor in a semiconductor body having a first main surface. The transistor includes: a source contact electrically connected to a source region; a drain contact electrically connected to a drain region; a gate electrode at the channel region, the channel region and a drift zone disposed along a first direction between the source and drain regions, the first direction being parallel to the first main surface, the channel region patterned into a ridge by adjacent gate trenches formed in the first main surface, the adjacent gate trenches spaced apart in a second direction perpendicular to the first direction, a longitudinal axis of the ridge extending in the first direction and a longitudinal axis of the gate trenches extending in the first direction; and at least one of the source and drain contacts being adjacent to a second main surface opposite the first main surface.


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