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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10437147 B1

PDFFull Text
Date of Patent:
Oct. 08, 2019

Filed:

Mar. 28, 2017

Resist composition and method for forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takashi Nagamine, Kawasaki, JP;

Yuta Iwasawa, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe, Martens, Olson & Bear LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/26 (2006.01); H01L 21/027 (2006.01); C07C 381/12 (2006.01); C08F 224/00 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 381/12 (2013.01); C08F 224/00 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/091 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/26 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); H01L 21/0274 (2013.01);
Abstract

A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an α-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as a cyano group at a side chain terminal, and a compound whose a conjugate acid has an acid dissociation constant (pKa) of less than 3.

Find Patent Forward Citations

Nagamine, Takashi. (2019). Resist composition and method for forming resist pattern (U.S. Patent No. 10437147). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10437147

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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