The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2019
Filed:
Sep. 27, 2016
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Inventors:
Assignee:
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 24/00 (2006.01); G03F 7/32 (2006.01); B01D 61/00 (2006.01); B01D 71/40 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); B01D 67/00 (2006.01); B01D 69/02 (2006.01); B01D 71/64 (2006.01); B32B 5/16 (2006.01); C08J 9/26 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/322 (2013.01); B01D 61/00 (2013.01); B01D 67/003 (2013.01); B01D 67/0032 (2013.01); B01D 69/02 (2013.01); B01D 71/40 (2013.01); B01D 71/64 (2013.01); B32B 5/16 (2013.01); C08J 9/26 (2013.01); G03F 7/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/091 (2013.01); G03F 7/16 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/40 (2013.01); B01D 67/0002 (2013.01); B01D 67/0023 (2013.01); B01D 67/0088 (2013.01); B01D 67/0093 (2013.01); B01D 2323/12 (2013.01); B01D 2323/18 (2013.01); B01D 2325/021 (2013.01); C08J 2201/04 (2013.01);
Abstract
A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.