The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Sep. 27, 2016
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Yoshie Tarutani, Naka, JP;

Kenji Kubota, Naka, JP;

Kiyotaka Nakaya, Naka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25C 1/12 (2006.01);
U.S. Cl.
CPC ...
C25C 1/12 (2013.01);
Abstract

The present invention provides an additive for high-purity copper electrolytic refining, a method of producing high-purity copper, and a high-purity electrolytic copper. This additive of the present invention for high-purity copper electrolytic refining can be added to a copper electrolyte in copper electrolytic refining. The additive includes a silver and chlorine reducing agent of electrolytic copper which is formed of tetrazoles which is one of a tetrazole and a tetrazole derivative.


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