The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Sep. 21, 2018
Applicant:

United Microelectronics Corp., Hsinchu, TW;

Inventors:

Te-Huang Chiu, Hsinchu, TW;

Weng-Yi Chen, Zhubei, TW;

Kuan-Yu Wang, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81B 7/00 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00246 (2013.01); B81B 7/0006 (2013.01); B81C 1/00428 (2013.01); B81B 2201/0214 (2013.01); B81B 2201/0257 (2013.01); B81B 2203/0127 (2013.01); B81B 2203/0315 (2013.01); B81B 2203/0384 (2013.01); B81B 2203/0392 (2013.01); B81B 2203/04 (2013.01); B81C 2201/014 (2013.01); B81C 2203/0735 (2013.01); B81C 2203/0771 (2013.01);
Abstract

A manufacturing method for a semiconductor structure is disclosed. The semiconductor structure includes a MEMS region. The MEMS region includes a sensing membrane and a metal ring. The metal ring defines a cavity under the sensing membrane.


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