The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2019
Filed:
Sep. 20, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Kun Xu, Sunol, CA (US);
Kevin Lin, Zhubei, TW;
Ingemar Carlsson, Milpitas, CA (US);
Shih-Haur Shen, Sunnyvale, CA (US);
Tzu-Yu Liu, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of polishing includes polishing a layer of a substrate, monitoring the layer of the substrate with an in-situ monitoring system to generate signal that depends on a thickness of the layer, filtering the signal to generate a filtered signal, determining an adjusted threshold value from an original threshold value and a time delay value representative of time required for filtering the signal, and triggering a polishing endpoint when the filtered signal crosses the adjusted threshold value.