The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Mar. 14, 2017
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Yusuke Mochizuki, Ashigarakami-gun, JP;

Makoto Sawada, Ashigarakami-gun, JP;

Takeshi Narita, Ashigarakami-gun, JP;

Shigehide Itou, Ashigarakami-gun, JP;

Hiroyuki Noda, Ashigarakami-gun, JP;

Atsushi Mukai, Ashigarakami-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 71/70 (2006.01); B01D 53/22 (2006.01); B01D 69/12 (2006.01); B01D 71/64 (2006.01); B01D 69/02 (2006.01);
U.S. Cl.
CPC ...
B01D 71/70 (2013.01); B01D 53/228 (2013.01); B01D 69/02 (2013.01); B01D 69/125 (2013.01); B01D 71/64 (2013.01); B01D 2256/10 (2013.01); B01D 2256/16 (2013.01); B01D 2256/24 (2013.01); B01D 2256/245 (2013.01); B01D 2257/302 (2013.01); B01D 2257/304 (2013.01); B01D 2257/308 (2013.01); B01D 2257/404 (2013.01); B01D 2257/504 (2013.01); B01D 2323/12 (2013.01);
Abstract

Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator.0.9≥≥0.55  Expression 1≥1.7  Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.


Find Patent Forward Citations

Loading…