The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2019

Filed:

Nov. 03, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Albert M. Chu, Nashua, NH (US);

Myung-Hee Na, Lagrangeville, NY (US);

Ravikumar Ramachandran, Pleasantville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); H01L 27/02 (2006.01); H01L 27/118 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0207 (2013.01); G06F 17/5072 (2013.01); G06F 17/5077 (2013.01); H01L 27/11807 (2013.01); H01L 2027/11866 (2013.01);
Abstract

A method is presented for forming a layout of a MOSFET (metal oxide semiconductor field effect transistor) circuit. The method includes forming a plurality of gate conductors, forming a plurality of active areas, and forming at least one gate contact (CB contact) within an active region of the plurality of active regions. The method further includes placing a marker over the at least one gate contact to identify a location of the at least one gate contact. Additionally, a distance between the at least one gate contact and at least one TS contact is optimized based on device specifications.


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