The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Oct. 09, 2014
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Leonid Gorkhover, Ulm, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70891 (2013.01); G03F 7/706 (2013.01); G03F 7/70266 (2013.01); G03F 7/70308 (2013.01); G03F 7/70316 (2013.01); G03F 7/70841 (2013.01); G03F 7/70883 (2013.01);
Abstract
A microlithographic apparatus comprises an optical wavefront manipulator. The latter includes an optical element and a gas-tight cavity that is partly confined by the optical element or contains it. A gas inlet device directs a gas jet towards the optical element. The location, where the gas jet impinges on the optical element after it has passed through the cavity, is variable in response to a control signal supplied by a control unit. A gas outlet is in fluid connection with the vacuum pump so that, upon operation of the vacuum pump, the pressure within the cavity is less than 10 mbar even if the gas jet passes through the cavity.