The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Feb. 27, 2018
Hitachi High-technologies Corporation, Tokyo, JP;
Hiroyuki Takayama, Tokyo, JP;
Kazuhiro Nakamura, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A rinse mechanism rinses reaction cuvettes with first and second detergents. An Rreagent pipetting mechanismrinses the reaction cuvettes that have been rinsed by the rinse mechanism with a special detergent. A counting unit counts and stores in a storage unit a use frequency of each reaction cuvette for a specific reagent item. A determining unit determines whether the counted use frequency exceeds a predetermined threshold N. A control unit controls the Rreagent pipetting mechanism such that, in a case where the counted use frequency exceeds the predetermined threshold N, the reaction cuvettes, which have exceeded the predetermined threshold N, are soaked with the special detergent only for a period equal to or less than a value derived by multiplying a pipetting cycle time, which indicates a period when a sample is pipetted, by the total number of reaction cuvettes and a predetermined integer.