The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Mar. 30, 2017
Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;
Pengchuan Ma, Shanghai, CN;
Yiqiang Tian, Shanghai, CN;
Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;
Abstract
A light intensity modulation method implemented by using a mask () includes the steps of: 1) based on a circle of confusion (CoC) function of an illumination system (), an initial light intensity distribution of an illumination field of view (FOV) and a target light intensity distribution of the illumination FOV, calculating a transmittance distribution of the mask () used to modulate the initial light intensity distribution into the target light intensity distribution; 2) meshing the mask () according to a desired accuracy of the target light intensity distribution and determining a distribution of opaque dots in each of cells resulting from the meshing based on the transmittance distribution of the mask () and a desired accuracy of the transmittance distribution; and 3) fabricating the mask () based on the determined distribution of the opaque dots and then deploying the mask () in the illumination system. Advantages including a high modulation accuracy, an applicability to wide FOV size, light intensity and wavelength ranges and compatibility with established manufacturing processes can be attained.