The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2019
Filed:
Feb. 27, 2017
Asml Netherlands B.v., Veldhoven, NL;
Johannes Matheus Marie De Wit, Helmond, NL;
Kim Gerard Feijen, Overpelt, NL;
Anko Jozef Cornelus Sijben, Veghel, NL;
Martinus Maassen, Utrecht, NL;
Henricus Martinus Johannes Van De Groes, Tiel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.