The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
May. 25, 2018
Indian Institute of Science, Bangalore, Karnataka, IN;
Shubhadeep Bhattacharjee, Bangalore, IN;
Kolla Lakshmi Ganapathi, Bangalore, IN;
Sangeneni Mohan, Bangalore, IN;
Navakanta Bhat, Bangalore, IN;
Indian Institute of Science, Bangalore, IN;
Abstract
The field effect transistor (FET) of the present subject matter comprises a bottom gate electrode, a bottom gate dielectric provided on the bottom gate electrode, a channel layer provided on the bottom gate dielectric. A top portion comprising a source electrode, a drain electrode, a top gate electrode provided, and a top dielectric layer is provided on the channel layer. The channel layer forms Schottky barriers at points of contact with the source and the drain electrode. A back-gate voltage varies a height and a top-gate voltage varies a width of the Schottky barrier. The FET can be programmed to work in two operating modes-tunnelling (providing low power consumption) and thermionic mode (providing high performance). The FET can also be programmed to combine the tunnelling and thermionic mode in a single operating cycle, yielding high performance with low power consumption.