The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2019

Filed:

Feb. 20, 2018
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventor:

Yoshihisa Matsubara, Hitachinaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/11546 (2017.01); H01L 29/788 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 21/28 (2006.01); H01L 29/792 (2006.01); H01L 27/1157 (2017.01); H01L 27/11573 (2017.01);
U.S. Cl.
CPC ...
H01L 27/11546 (2013.01); H01L 21/26513 (2013.01); H01L 21/28282 (2013.01); H01L 27/1157 (2013.01); H01L 27/11573 (2013.01); H01L 29/42324 (2013.01); H01L 29/42344 (2013.01); H01L 29/6656 (2013.01); H01L 29/66545 (2013.01); H01L 29/66833 (2013.01); H01L 29/7883 (2013.01); H01L 29/792 (2013.01); H01L 29/6659 (2013.01);
Abstract

In a semiconductor device including a higher-breakdown-voltage MISFET, an improvement is achieved in the breakdown voltage of the MISFET, while preventing an increase in the area of the MISFET. A gate pattern including a gate electrode of the higher-breakdown-voltage MISFET is formed higher in level than a gate pattern including a gate electrode of a lower-breakdown-voltage MISFET. An n-type semiconductor region included in each of source/drain regions of the higher-breakdown-voltage MISFET is formed deeper than an n-type semiconductor region included in each of source/drain regions of the lower-breakdown-voltage MISFET.


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