The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2019

Filed:

Apr. 27, 2018
Applicant:

Ngk Insulators, Ltd., Nagoya-shi, Aichi, JP;

Inventors:

Mikiya Ichimura, Ichinomiya, JP;

Sota Maehara, Nagoya, JP;

Yoshitaka Kuraoka, Okazaki, JP;

Assignee:

NGK INSULATORS, LTD., Nagoya-shi, Aichi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/34 (2006.01); H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 29/201 (2006.01); H01L 21/205 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/812 (2006.01); C30B 19/02 (2006.01); C30B 29/40 (2006.01); H01L 29/205 (2006.01); C23C 16/30 (2006.01); H01L 29/207 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02389 (2013.01); C23C 16/303 (2013.01); C23C 16/34 (2013.01); C30B 19/02 (2013.01); C30B 29/406 (2013.01); H01L 21/0251 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02458 (2013.01); H01L 21/205 (2013.01); H01L 29/201 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/401 (2013.01); H01L 29/66007 (2013.01); H01L 29/66462 (2013.01); H01L 29/778 (2013.01); H01L 29/7786 (2013.01); H01L 29/7787 (2013.01); H01L 29/812 (2013.01); H01L 29/207 (2013.01);
Abstract

An epitaxial substrate for semiconductor elements which suppresses the occurrence of current collapse. The epitaxial substrate for the semiconductor elements includes: a semi-insulating free-standing substrate formed of GaN doped with Zn; a buffer layer adjacent to the free-standing substrate; a channel layer adjacent to the buffer layer; and a barrier layer provided on an opposite side of the buffer layer with the channel layer provided therebetween, wherein the buffer layer is a diffusion suppressing layer that suppresses the diffusion of Zn from the free-standing substrate into the channel layer.


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Ichimura, Mikiya. (2019). Epitaxial substrate for semiconductor elements, semiconductor element, and manufacturing method for epitaxial substrates for semiconductor elements (U.S. Patent No. 10410859). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10410859

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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