The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
May. 12, 2015
Asml Netherlands B.v., Veldhoven, NL;
Aart Adrianus Van Beuzekom, Eindhoven, NL;
Jozef Augustinus Maria Alberti, Nederweert, NL;
Hubert Marie Segers, 's-Hertogenbosch, NL;
Ronald Van Der Ham, Maarheeze, NL;
Francis Fahrni, Eindhoven, NL;
Ruud Olieslagers, Eindhoven, NL;
Gerben Pieterse, Eindhoven, NL;
Cornelius Maria Rops, Waalre, NL;
Pepijn Van Den Eijnden, Veldhoven, NL;
Paul Van Dongen, Eindhoven, NL;
Bas Willems, Nijmegen, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.