The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2019
Filed:
Feb. 26, 2015
Applicant:
Fujimi Incorporated, Kiyosu-shi, Aichi, JP;
Inventor:
Toshio Shinoda, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/00 (2006.01); C09K 3/14 (2006.01); B24B 37/04 (2012.01); H01L 21/3105 (2006.01); C09G 1/02 (2006.01); B24D 3/02 (2006.01); B24D 11/00 (2006.01); B24D 18/00 (2006.01); C08K 3/14 (2006.01); C08K 3/22 (2006.01); C08K 3/36 (2006.01);
U.S. Cl.
CPC ...
B24B 37/044 (2013.01); C09G 1/02 (2013.01); C09K 3/1463 (2013.01); H01L 21/31053 (2013.01); C08K 3/14 (2013.01); C08K 3/22 (2013.01); C08K 3/36 (2013.01);
Abstract
The present invention provides a polishing composition with which differences in height of a SiN film can be sufficiently removed. The present invention is a polishing composition for use in polishing a polishing object having a surface which is positively charged at a pH of less than 6, containing water, abrasive grains, and an anionic copolymer having a specific unit structure, and having a pH of less than 6, wherein the anionic copolymer has at least two acidic groups having different acidities.