The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2019

Filed:

Nov. 09, 2016
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Mariusch Gregor, Gilroy, CA (US);

Thorsten Lill, Santa Clara, CA (US);

David Trussell, Fremont, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); H01J 37/32 (2006.01); C23C 16/505 (2006.01); C23C 16/52 (2006.01); G01J 3/50 (2006.01); H01L 21/67 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/4401 (2013.01); C23C 16/4404 (2013.01); C23C 16/45565 (2013.01); C23C 16/45574 (2013.01); C23C 16/45589 (2013.01); C23C 16/505 (2013.01); C23C 16/5096 (2013.01); C23C 16/52 (2013.01); G01J 3/50 (2013.01); H01J 37/32091 (2013.01); H01J 37/32183 (2013.01); H01J 37/32697 (2013.01); H01J 37/32715 (2013.01); H01J 37/32981 (2013.01); H01L 21/67069 (2013.01); H01L 21/67253 (2013.01);
Abstract

An active showerhead used for a plasma reactor is described. The active showerhead includes a plurality of substrate layers. The substrate layers include at least one actuator and transfer component. The actuator and transfer component is coupled to a gas line via a gas channel. The active showerhead further includes an electrode layer located below the substrate layers. The electrode layer and the actuator and transfer component both share an opening. The actuator and transfer component allows passage of one or more process gases received from the gas line and the gas channel into the opening without the need for a conventional gas box.


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