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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10401736 B1

PDFFull Text
Date of Patent:
Sep. 03, 2019

Filed:

Feb. 22, 2018

Exposure device, substrate processing apparatus, exposure method of substrate and substrate processing method

Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Tomohiro Matsuo, Kyoto, JP;

Yasuhiro Fukumoto, Kyoto, JP;

Takafumi Oki, Kyoto, JP;

Masaya Asai, Kyoto, JP;

Masahiko Harumoto, Kyoto, JP;

Yuji Tanaka, Kyoto, JP;

Chisayo Nakayama, Kyoto, JP;

Assignee:

SCREEN Holdings Co., Ltd., , JP;

Attorney:

Ostrolenk Faber LLP

Primary Examiner:

Michelle M Iacoletti

Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01); G03F 7/16 (2006.01); B81C 1/00 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7055 (2013.01); B81C 1/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/70008 (2013.01); G03F 7/70558 (2013.01); G03F 7/70858 (2013.01); G03F 7/70933 (2013.01); H01L 21/0274 (2013.01); H01L 21/31133 (2013.01); H01L 21/67115 (2013.01); H01L 21/67253 (2013.01); H01L 21/67748 (2013.01); H01L 21/68742 (2013.01);
Abstract

An atmosphere in a processing chamber in which a substrate is stored is discharged by a suction device. At a time point at which oxygen concentration in the processing chamber is lowered to predetermined exposure starting concentration, emission of vacuum ultraviolet rays from a light source to the substrate is started. The emission of the vacuum ultraviolet rays to the substrate is stopped at a time point at which the exposure amount of the substrate increases to a predetermined set exposure amount. The exposure starting concentration is defined in advance to be higher than 1% and lower than oxygen concentration in the air, and is defined in advance such that ozone generated from oxygen atoms by the emission of the vacuum ultraviolet rays do not damage the film on the surface to be processed of the substrate.

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