The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

Jun. 22, 2018
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventor:

Ulrich Wegmann, Koenigsbronn, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/706 (2013.01); G01M 11/0221 (2013.01); G01M 11/0271 (2013.01); G01M 11/0285 (2013.01);
Abstract

A device and a method for wavefront analysis. The device is designed for analyzing the wavefront of at least one light wave passing through an optical system, and has at least one illumination mask (), at least one first grating (), at least one second grating () arranged in the predefined plane and at least one detector () for detecting said superimposition pattern. The at least one first grating has at least one first grating structure and generates an interferogram in a predefined plane from a wavefront to be analyzed which proceeds from the illumination mask and passes through the optical system. The at least one second grating has at least one second grating structure and generates a superimposition pattern by the superimposition of the second grating structure with the interferogram generated by the first grating.


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