The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

Jun. 26, 2013
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Simon R. Lancaster-Larocque, Gloucester, CA;

Collin Chan, San Jose, CA (US);

Kensuke Uemura, Niigata, JP;

Purwadi Raharjo, Niigata, JP;

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 15/00 (2006.01); B23K 15/02 (2006.01); B23K 20/12 (2006.01); H01J 37/05 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
B23K 15/00 (2013.01); B23K 15/02 (2013.01); B23K 20/122 (2013.01); H01J 37/05 (2013.01); H01J 37/305 (2013.01); H01J 2237/05 (2013.01);
Abstract

The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.


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