The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2019

Filed:

Dec. 18, 2015
Applicant:

The Regents of the University of Colorado, a Body Corporate, Denver, CO (US);

Inventors:

Steven M. George, Boulder, CO (US);

Younghee Lee, Boulder, CO (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); C23F 1/12 (2006.01); H01L 21/306 (2006.01); H01L 21/311 (2006.01); H01L 21/465 (2006.01); H01L 21/3213 (2006.01); H01L 21/67 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28185 (2013.01); C23F 1/12 (2013.01); H01L 21/30621 (2013.01); H01L 21/31122 (2013.01); H01L 21/32135 (2013.01); H01L 21/465 (2013.01); H01L 21/67069 (2013.01); H01L 21/67253 (2013.01); H01L 29/517 (2013.01);
Abstract

The invention includes a method of promoting atomic layer etching (ALE) of a surface. In certain embodiments, the method comprises sequential reactions with a metal precursor and a halogen-containing gas. The invention provides a solid substrate obtained according to any of the methods of the invention. The invention further provides a porous substrate obtained according to any of the methods of the invention. The invention further provides a patterned solid substrate obtained according to any of the methods of the invention.


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