The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2019

Filed:

Jun. 22, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Satoshi Shimmura, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); H01L 21/67 (2006.01); B05C 11/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); B05C 11/08 (2013.01); H01L 21/6715 (2013.01); H01L 21/67017 (2013.01);
Abstract

A liquid processing apparatus includes a substrate holding part, a processing liquid supply part configured to supply a processing liquid to the substrate, a cup body provided to surround the substrate and configured to drain the processing liquid scattered by the rotation of the substrate, a solvent supply part configured to supply a solvent for dissolving a solid component generated from the processing liquid, an exhaust path member having an exhaust port opened inside the cup body, and configured to exhaust an atmosphere around the substrate, and a liquid diffusion part having a concavo-convex pattern and provided on an inner surface of an exhaust path so that the solvent is spread by a capillary phenomenon inside the exhaust path through which the atmosphere is exhausted. The exhaust path is formed inside the cup body and the exhaust path member.


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