The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2019
Filed:
Nov. 13, 2009
Applicants:
Akiko Kobayashi, Tokyo, JP;
Akira Shimizu, Tokyo, JP;
Nobuyoshi Kobayashi, Tokyo, JP;
Woo-jin Lee, Tokyo, JP;
Inventors:
Akiko Kobayashi, Tokyo, JP;
Akira Shimizu, Tokyo, JP;
Nobuyoshi Kobayashi, Tokyo, JP;
Woo-Jin Lee, Tokyo, JP;
Assignee:
ASM IP Holding B.V., Versterkerstraat 8, Almere 1322 AP, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/32 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); H01L 21/02 (2006.01); C23C 16/455 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
C23C 16/402 (2013.01); C23C 16/325 (2013.01); C23C 16/345 (2013.01); C23C 16/45542 (2013.01); C23C 16/45553 (2013.01); H01L 21/0214 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02164 (2013.01); H01L 21/02219 (2013.01); H01L 21/02274 (2013.01);
Abstract
A method of forming an insulation film by alternating multiple times, respectively, a process of adsorbing a precursor onto a substrate and a process of treating the adsorbed surface using reactant gas and a plasma, wherein a plasma is applied in the process of supplying the precursor.