The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2019

Filed:

Oct. 30, 2015
Applicant:

Synopsys, Inc., Mountain View, CA (US);

Inventors:

Himanshu Sharma, Mountain View, CA (US);

Byungwook Kim, Los Altos Hills, CA (US);

Virender Kashyap, Noida, IN;

Abhishek Khandelwal, Noida, IN;

Assignee:

SYNOPSYS, INC., Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/00 (2006.01); G03F 1/68 (2012.01); G03F 1/70 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0035 (2013.01); G03F 1/68 (2013.01); G03F 1/70 (2013.01); G03F 7/70466 (2013.01); G06F 17/5072 (2013.01); G06F 17/5081 (2013.01);
Abstract

A computer-implemented method for constructing a design characterized by a double patterning layer is presented. The method includes receiving the design in a memory of the computer when the computer is invoked to construct the design. The method further includes generating, using the computer, a multitude of fill shapes along a multitude of tracks associated with a multitude of net shapes. The multitude of fill shapes and the multitude of net shapes are decomposable into two colors in accordance with a spacing constraint of the double patterning layer.


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