The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2019

Filed:

Nov. 02, 2017
Applicant:

Verity Instruments, Inc., Carrollton, TX (US);

Inventors:

Andrew Weeks Kueny, Carrollton, TX (US);

Mike Whelan, Carrollton, TX (US);

Mark Anthony Meloni, Carrollton, TX (US);

John D. Corless, Carrollton, TX (US);

Rick Daignault, Carrollton, TX (US);

Sean Lynes, Carrollton, TX (US);

Assignee:

Verity Instruments, Inc., Carrollton, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 1/00 (2006.01); G01N 21/27 (2006.01); G01J 3/28 (2006.01); G01J 3/443 (2006.01); G01N 21/66 (2006.01); H01J 37/32 (2006.01); H01L 21/68 (2006.01); H01L 21/66 (2006.01); H05H 1/00 (2006.01); G01N 21/73 (2006.01); G01N 21/84 (2006.01);
U.S. Cl.
CPC ...
G01N 21/274 (2013.01); G01J 3/2823 (2013.01); G01J 3/443 (2013.01); G01N 21/66 (2013.01); G01N 21/73 (2013.01); H01J 37/32963 (2013.01); H01J 37/32972 (2013.01); H01L 21/681 (2013.01); H01L 22/26 (2013.01); H05H 1/0006 (2013.01); G01N 2021/8416 (2013.01); H01J 2237/2482 (2013.01);
Abstract

The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.


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