The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Feb. 02, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jonghoon Baek, San Diego, CA (US);
Mathew Cheeran Abraham, San Diego, CA (US);
David Robert Evans, San Diego, CA (US);
Jack Michael Gazza, San Diego, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G03F 7/20 (2006.01); G02B 19/00 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/005 (2013.01); G02B 19/0095 (2013.01); G02B 27/0006 (2013.01); G03F 7/70033 (2013.01); G03F 7/70175 (2013.01); G03F 7/70925 (2013.01); G03F 7/70933 (2013.01); H05G 2/008 (2013.01);
Abstract
A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.