The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2019

Filed:

Jun. 15, 2017
Applicant:

Sumitomo Electric Device Innovations, Inc., Yokohama, Kanagawa, JP;

Inventor:

Yoshihide Komatsu, Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11507 (2017.01); H01L 29/94 (2006.01); H01L 21/04 (2006.01); H01L 23/522 (2006.01); H01L 29/49 (2006.01); H01L 29/51 (2006.01); H01L 29/739 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/94 (2013.01); H01L 21/0425 (2013.01); H01L 23/5222 (2013.01); H01L 28/75 (2013.01); H01L 29/4908 (2013.01); H01L 29/4975 (2013.01); H01L 29/517 (2013.01); H01L 29/7394 (2013.01);
Abstract

A metal-insulator-metal (MIM) capacitor and a process of forming the same are disclosed. The process includes steps of: forming a lower electrode that provides a lower layer and an upper layer; forming an opening in the upper layer; forming a supplemental layer on the lower layer exposed in the opening; heat treating the lower electrode and the supplemental layer; covering at least the upper layer of the lower electrode with an insulating film; and forming an upper electrode in an area on the insulating film, where the area is not overlapped with the supplemental layer and is within 100 μm at most from the supplemental layer. A feature of the MIM capacitor is that the supplemental layer is made of a same metal as a metal contained in the lower layer of the lower electrode.


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