The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2019

Filed:

Mar. 26, 2018
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventor:

Yoshiki Yamamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/00 (2006.01); H01L 27/11 (2006.01); G11C 11/419 (2006.01); H01L 23/528 (2006.01); H01L 27/12 (2006.01); H01L 29/06 (2006.01); G11C 11/412 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1104 (2013.01); G11C 11/412 (2013.01); G11C 11/419 (2013.01); H01L 23/528 (2013.01); H01L 27/0207 (2013.01); H01L 27/1116 (2013.01); H01L 27/1203 (2013.01); H01L 29/0649 (2013.01); H01L 29/0692 (2013.01);
Abstract

A semiconductor device, includes: a semiconductor substrate having a first well region; an insulating layer formed on a first portion of the semiconductor substrate, and contacted with the first well region; a semiconductor layer formed on the insulating layer; an element isolation region reaching to an inside of the first well region, in cross-section view; a first gate electrode layer formed on a first portion of the semiconductor layer via a first gate insulating film; a second gate electrode layer formed on a second portion of the semiconductor layer via a second gate insulating film, and formed on a first portion of the element isolation region; an interlayer insulating film covering the first gate electrode layer, the second gate electrode layer and a second portion of the element isolation region; and a first plug conductor layer formed in the interlayer insulating film.


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