The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Sep. 25, 2015
Applicant:
Hitachi High-technologies Corporation, Tokyo, JP;
Inventors:
Kengo Asai, Tokyo, JP;
Toru Iwaya, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Hiroyasu Shichi, Tokyo, JP;
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/31 (2006.01); H01J 37/28 (2006.01); H01J 37/20 (2006.01); H01J 37/09 (2006.01); H01J 37/08 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01J 37/31 (2013.01); H01J 37/08 (2013.01); H01J 37/09 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01J 37/305 (2013.01); H01J 2237/0262 (2013.01); H01J 2237/04732 (2013.01);
Abstract
To provide an ion milling system that can suppress an orbital shift of an observation electron beam emitted from an electron microscope column, the ion milling system includes: a Penning discharge type ion gunthat includes a permanent magnetand that generates ions for processing a sample; and a scanning electron microscope for observing the sample, in which a magnetic shieldfor reducing a leakage magnetic field from the permanent magnetto the electron microscope column is provided.