Relative position measurement based alignment system, double workpiece stage system and measurement system

Abstract

An alignment system, a dual-wafer-stage system and a measurement system are disclosed, the alignment system including a main frame (), a first wafer stage (), an alignment sensor (), a position acquisition module () and a signal processing device (). The position acquisition module () collects positional data from the first wafer stage () and the reflector () simultaneously. The reflector () is arranged on the alignment sensor (). In other words, positional data of the alignment sensor () and positional data of the first wafer stage () are collected simultaneously. In addition, the data can be processed to indicate the relative position of the first wafer stage () relative to the alignment sensor () whose vibration has been zeroed. That is, a position where an alignment mark is aligned can be obtained with the relative vibration amplitude of the alignment sensor () being zeroed. This can circumvent the impact of vibration of the alignment sensor () and allow increased repeatability accuracy of alignment.