The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Apr. 07, 2016
Tokyo Electron Limited, Minato-ku, Tokyo, JP;
Jianping Zhao, Austin, TX (US);
Lee Chen, Cedar Creek, TX (US);
Barton G. Lane, Austin, TX (US);
Merritt Funk, Austin, TX (US);
Radha Sundararajan, Sugar Land, TX (US);
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
The present invention provides a SWP (surface wave plasma) processing system that does not create underdense conditions when operating at low microwave power and high gas pressure, thereby achieving a larger process window. The DC ring subsystem can be used to adjust the edge to central plasma density ratio to achieve uniformity control in the SWP processing system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile