The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Dec. 28, 2016
Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;
Lili Ge, Shanghai, CN;
Yuebin Zhu, Shanghai, CN;
Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;
Abstract
A motion stage device, an exposure device and a lithography machine are disclosed. The motion stage device includes: Y-direction motors (), a mover of each Y-direction motor () movable in a horizontal Y-direction; X-direction motors provided on X-direction guide rails (), the X-direction guide rails () is in connection with the movers of the Y-direction motors () and movable in the horizontal Y-direction under actuation of the Y-direction motors (), the X-direction motors having movers () movable in a horizontal X-direction; an inner frame (), supporting the X-direction guide rails (); and a motion stage (), disposed on the movers () of the X-direction motor. This motion stage device possesses improved modal and vibration characteristics because of a reduced load on the Y-direction motors (). Additionally, the X-direction guide rails () are in non-contact connection with the inner frame () and thus will not pose significant vibration-causing impacts on the inner frame (). This allows stable movement and improved control accuracy.